XUUS – high harmonic generation source for EUV and soft X-ray
From the pioneer in robust, engineered EUV systems
Good news: you no longer have to dedicate your laboratory resources to building a high harmonic generation (HHG) system. The 4th generation of KMLabs' XUUS™ extreme UV ultrafast source is a turnkey system that gets you right into your experiment. XUUS4 is a coherent EUV/soft X-ray light source based on high harmonic generation. It is a fully-engineered and integrated commercial source based on a single robust opto-mechanical platform.
XUUS4 upconverts ultrafast laser pulses into the Extreme UV (EUV or XUV) or soft X-ray regions of the spectrum. Employing HHG processes, the output beam inherits the coherent properties of a driving laser such as the KMLabs RAEA with wavelengths that can be tuned from ~10 to 47 nm. Moreover, customized systems can generate coherent beams with wavelengths as short as 6.5 nm. XUUS4 employs KMLabs' patented hollow waveguide for the high harmonic up-conversion process.
The XUUS hollow-core fiber, or waveguide, architecture enables harmonics generated by the system to be distinguished from other HHG methods, guaranteeing your harmonics originate from the same point in space every time, minimizing any pointing drift. This optimizes repeatability for your experiments. Additionally, the use of a fiber rather than typical gas jet or semi-infinite gas cell target geometries provides superior pressure tunability for phase-matched HHG. Now you can choose robustness without sacrificing flexibility.
Applications:
Photoemission: tr-ARPES & attosecond materials science
Metrology for nanoelectrics and in support of EUV lithography
High-resolution and time-resolved lensless nanoimaging
Ultrafast magnetic materials & spintronics studies
High spatial and temporal resolution pump-probe studies of magnetic, materials, molecular, and nanosystems dynamics
Molecular dynamics and attoscience
Features that achieve significant benefits:
Patented high harmonic conversion in a waveguide for optimum conversion, stability, repeatability and robustness
EUV flux can exceed > 1×1012 ph/sec for the most demanding applications
Ultrastable, 4-axis active stabilization of the beam, generating an EUV beam intensity and wavefront stability comparable to visible-IR lasers
High average power handling capability driving next generation experiments
Diagnostic cameras for performance monitoring and alignment control
Graphical, intuitive software control
Stable, industrial optical mounting on a temperature-stabilized platform
A growing family of application-specific beamlines delivering photons tailored to your experiment
Highly coherent, laser-like EUV (XUV) / SXR
Custom XUUS systems to generate soft X-rays to wavelengths ~6 nm
Waveguide design allows efficient use of high-pressure gas with minimum gas usage:1000x less than a gas jet geometry and up to 100x greater efficiency
XUUS output can be optimized for different applications: ARPES, imaging, transient absorption, MOKE, XMCD
Wavelength
Flux*
Repetition Rate
Pointing Stability
Power Stability
30 nm
>5x1012 ph/sec per harmonic
1 - 20
<5 µrad RMS
<5% RMS
13 nm
>1010 ph/sec per harmonic
1 - 10
<5 µrad RMS
<5% RMS
6 nm
>106 ph/sec per 10% BW
1
<10 µrad RMS
<10% RMS
*Achievable when optimally coupled to KMLabs RAEATM Ti:sapphire amplifier. Performance will vary with other driving lasers.
Featured Applications:
KMLabs’ XUUS Source Enables 1st sub-wavelength EUV 13.5 nm imaging
Wide Field-of-View Reflection-Mode Ptychographic Imaging Microscope with Tabletop 12.7 nm High Harmonic Illumination
商品属性 [波长] 6 nm/13 nm/30nm [重复频率] 1/1-10/1-20Hz